# 双重曝光下的AI工程师剪影

Canonical: https://prompt.genedai.me/prompts/opennana-12539/
Author: @exinelabs
Original public source: https://x.com/exinelabs/status/2025789033914433555
Collection item: https://opennana.com/awesome-prompt-gallery/double-exposure-ai-engineer
Model (source label): Nano banana pro
Reference requirement: 参考图要求未核实
Snapshot: 2026-10-20

## Prompt

```
A double exposure photograph depicting the silhouette profile and headshot portrait of an AI engineer, with a symbolic environment constructed from glowing neural networks, floating code streams, and futuristic server architecture, in the style of double exposure photography, sun flare, white background, hyper-realistic, detailed rendering, stock photo, high-resolution photography.
```

## 中文提示词

一张双重曝光照片，描绘了一位 AI 工程师的剪影侧面和头像特写，背景是由发光的神经网络、浮动的代码流和未来感十足的服务器架构构成的象征性环境，采用双重曝光摄影风格，带有太阳耀斑，白色背景，超现实主义，细节渲染，库存照片，高分辨率摄影。

## Attribution

License / authorization: 项目维护者确认转载授权；原作者权利保留
Rights notice: https://prompt.genedai.me/sources/opennana/
Image sources: https://img.opennana.com/prompts/assets/202604/1775074473247-ih11rbeh-1.jpg
Video sources: 
Date: 2026-04-01 (OpenNana 条目创建日期，不代表原帖发布日期)
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